5 products in this product line
Taiwan is an important part of the global electronics supply chain and a producer of a wide variety of electronic goods in the world. Sino-Japan Chemical also play a role in the supplying of chemicals to the electronic industry. We have different electronic specialty materials for various kinds of application. We have chemicals for solder flux formulation, CMP dispersing agent, low-foam cleaners for wafer cleaning process, LCD developing agent, Wafer cutting fluid & we continue to develop new electronic specialty chemicals to meet the industry's new technology.
|
Application |
Chemical Structure |
Products |
|
| Flux Cleaning Additives |
Alkyl end-capping alkyl polyoxyethylene ether |
PH-LF Series | |
| Electro-coppering additives |
EO-PO Copolymer |
SINOPOL PE Series | |
| Electro-coppering additives |
EO-PO Copolymer |
SINOPOL TE Series | |
| Chemical Tinning Process Additives |
Polyethylene Glycol Carboxymethyl Octyl Ether |
SINONATE TL-521-12 | |
| Soldering flux for circuit boards |
Polyoxyethylene Glycerol Ether |
SINOPOL GL系 | |
| Soldering flux for circuit boards |
Polyoxyethylene Sorbitol Ether |
SINOPOL TL-034 | |
| Soldering flux for circuit boards |
Polyethylene Glycol |
SINOPOL PEG600 | |
| Brightener Anionic surfactant, brightening agent to promote flat plating surface and fine particles |
Sodium P.O.E. Alkyl Ether Sulfate |
SINOPOL E8015SN-S5 | |
| Brightener Naphthol ethers type non-ionic surfactants, brightening agent to promote flat plating surface and fine particles |
Polyoxyethylene β Naphthanol |
SINOPOL B00系 | |
|
Application |
Chemical Structure |
Products |
|
| It has good penetration and dispersibility, which can stabilize the grinding particles and promote the flattening of the grinding process. |
Polyoxyethylene 2-Ethylhexyl Ether Phosphate |
SINONATE E8002P | |
| It has good penetration and dispersibility, which can stabilize the grinding particles and promote the flattening of the grinding process. |
Sodium Dialkyl Sulfosuccinate |
SINONATE 290MH | |
| It has good penetration and dispersibility, which can stabilize the grinding particles and promote the flattening of the grinding process. |
Ammonium Polyoxyethylene Alkyl Ether Sulfate |
SINONATE 1105SF | |
| Good permeability and dispersibility to stabilize the grinding particles and promote the flattening of the grinding process. |
Polypropylene glycol |
SINOPOL R-PPG400 | |
|
Application |
Chemical Structure |
Products |
|
| Wafer cleaner with low foaming, low metal ion content to remove particle residues and protect surfaces. |
EO-PO Copolymer |
SINOPOL PE Series, SINOPOL RPE Series | |
| Wafer cleaner with low foaming, low metal ion content to remove particle residues and protect surfaces. |
Polyoxyethylene Polyoxypropylene Butyl Ether |
SINOPOL R-1424FX | |
| It is used in the formulation of LCD cleaning agent, with strong cleaning and detergency. |
Alkyl Ethoxylate |
SINOPOL 2300 Series | |
|
Application |
Chemical Structure |
Products |
|
| Developer for LCD |
Nonionic surfactant |
SINOPOL 609 | |
|
Application |
Chemical Structure |
Products |
|
| Provides cooling and lubrication during wafer dicing. |
EO、PO Polyol Copolymer |
SINOPOL EWWS | |
| Provides cooling and lubrication during wafer dicing. |
Polyethylene Glycol |
SINOPOL PEG200 | |